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Aluminum Polishing Slurry
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We supply colloidal silica-based slurries for aluminum substrate polishing with high removal rate and low-defect. The slurries include acidic AL-1101 and alkaline AL-1001.
The products can be widely used in the processes of architecture, package, cell phone and tablet shell,etc.
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【Specification】
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Product Type |
AL-1101 |
AL-1001 |
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Advantages |
High removal rate |
Excellent corrosion inhibition |
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Excellent corrosion inhibition |
High stability |
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Low residue |
Low residue |
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No scratch |
No scratch |
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Low metal contamination |
Low metal contamination |
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pH 2-3 |
pH 9-11 |
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Solid Content:40%; Particle Size:80-110nm |
【Package】
Net Weight:250kg/drum.
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